Thermal Chemical Vapor Deposition (TCVD) System
Versatile Platform for Advanced Nanomaterials & 2D Thin Film Growth
Blue Wave Semiconductor offers the TCVD System, a versatile platform engineered for controlled chemical vapor deposition of advanced nanomaterials such as MoS₂, WS₂, and graphene. Designed around a robust quartz tube reactor, the system accommodates multiple small substrates or wafer pieces for flexible research workflows.[cite: 2]
The TCVD System incorporates a digitally controlled high-temperature heating module capable of reaching up to 1100°C. Its vacuum-compatible quartz tube is sealed with elastomer O-rings and stainless-steel flanges, featuring integrated gas inlet/outlet hardware enabling operation under vacuum or controlled-gas environments.[cite: 2]
TCVD Research & Industrial Capabilities
See Blue Wave Systems in Action
Explore live demonstrations and key capabilities of our custom semiconductor deposition equipment.
HFCVD Heater Z and Rotation Stage
Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.[cite: 1]
View SpecificationsSputtering Process
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. Sputter deposition is a physical vapor deposition (PVD) method for depositing thin films onto a substrate.[cite: 1]
View SpecificationsHFCVD Heater Z and Rotation Stage
Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.[cite: 1]
View SpecificationsIn-Depth System Information
1 Quartz Deposition Chamber
- Vacuum chamber equipped with a replaceable quartz tube designed to prevent cross-contamination[cite: 2]
- Stainless steel adapters with elastomer O-rings for tight seal around quartz tube[cite: 2]
- Conveniently removable adapters for easy quartz tube replacement and O-ring maintenance[cite: 2]
- Quick access ports on both sides for effortless sample loading[cite: 2]
- Precisely positioned within furnace for optimal heating efficiency and thermal exposure[cite: 2]
2 System Framework
- Clean room-grade frame for holding furnace and system components[cite: 2]
- Integrated rackmount mounting for electronics, power distribution, and control systems[cite: 2]
- Equipped with mobility casters and leveling features for easy installation and adjustment[cite: 2]
3 Chamber Pumping
- Oil mechanical pump capable of achieving high vacuum levels better than 5×10⁻³ Torr[cite: 2]
- Includes all hardware, vacuum plumbing, and valves for pumping and venting operations[cite: 2]
- Compact, efficient design optimized for long-term operational stability[cite: 2]
4 Oil Mechanical Pump
- High-performance rotary vane oil pump optimized for process stability[cite: 2]
- Equipped with an isolation valve to protect against oil back-streaming[cite: 2]
5 Gas Flow and Pressure Control
- Ventilated enclosure housing mass flow controllers (MFCs) interfaced with facility exhaust[cite: 2]
- Tailored selection of MFCs with built-in shut-off valves for safety and cross-contamination prevention[cite: 2]
- Two closed-loop pressure controllers for precise regulation at low and high pressure[cite: 2]
- Built-in pressure relief valve in ventilated gas cabinet for maximum safety[cite: 2]
6 Vacuum Gauge
- Combination gauge integrating capacitance and Pirani measurement methods[cite: 2]
- Digital pressure readout display included with mounting hardware and cables[cite: 2]
- Resists metal and oxide contamination over extended use[cite: 2]
7 Furnace
- Adjustable heating across three process zones for custom thermal profiles[cite: 2]
- Quartz tube precisely positioned to maximize heating efficiency and maintain uniform thermal profiles[cite: 2]
- Precise temperature controllability for consistent and repeatable thermal growth[cite: 2]
- Clean operation designed for high-temperature processing without introducing contamination[cite: 2]
8 Substrate Boat
- Constructed from high-temperature ceramic to ensure thermal stability[cite: 2]
- Accommodates a range of sample sizes and substrates[cite: 2]
- Straightforward loading/unloading operation using the provided loading rod[cite: 2]
9 System Cooling
- Water-cooled components maintain stable operation during high-temperature processes[cite: 2]
- Enhances overall process stability and thermal repeatability[cite: 2]
- Connected to an integrated recirculating chiller (e.g., CW-3000)[cite: 2]
10 Computer Control & Automation
- Gas flow control and monitoring[cite: 2]
- Chamber pressure control and vacuum measurements[cite: 2]
- Furnace power control and multi-zone temperature monitoring[cite: 2]
- Adjustable safety interlocks (Water Flow, Over Pressure, O₂/H₂ Ratio, Exhaust, Temp)[cite: 2]
- Library system for users to save and load custom recipes[cite: 2]
OP-1. Additional Gas/Mass Flow Controller
Add up to 6 additional mass flow controllers (MFCs) into the system. Gases may include Nitrogen (N₂), Argon (Ar), Methane (CH₄), Hydrogen (H₂), and various dopant gases. Contact Blue Wave for custom flow range options.[cite: 2]
OP-2. System Fume Hood
An external fume hood can be integrated to provide enhanced ventilation and safe removal of process exhaust. Fully compatible with standard laboratory ducting and exhaust systems for straightforward setup.[cite: 2]
TCVD System Brochure
Download our detailed brochure for complete specifications, configuration options, and ordering information.
View Product PageTechnical Specifications
| Specification | Parameter |
|---|---|
| Base Pressure | 5 × 10⁻³ Torr[cite: 2] |
| Operating Pressure Range | 1 – 760 Torr[cite: 2] |
| Mechanical Pump Speed | 17.4 m³/h[cite: 2] |
| Input Power | 208 VAC, 3 Phase, 10 Amp[cite: 2] |
| Substrate Temperature Range | 200 – 1200°C (3 Zone Controllers)[cite: 2] |
| Vacuum Pump | Oil Pump[cite: 2] |
| Cooling | Water Cooling[cite: 2] |
| Vacuum Seals | Elastomer O-rings[cite: 2] |
| Deposition Area | Up to 2” Diameter[cite: 2] |
| Deposition Capabilities | Single/Bilayer/Multilayer Graphene, MoS₂[cite: 2] |
| Substrate Holder | Ceramic Boat[cite: 2] |
| Tube Reactor | Quartz[cite: 2] |
| Interlock Control | Water Flow, Over Pressure, O₂/H₂ Ratio, Exhaust, Temperature[cite: 2] |
| System Size | 6 ft × 3 ft × 6 ft (L×D×H)[cite: 2] |
| MFCs (Customer Specified) | H₂: 0–200 SCCM | CH₄: 0–2000 SCCM | Ar: 0–200 SCCM[cite: 2] |
