Hot Filament Chemical Vapor Deposition (HFCVD) Banner

Hot Filament Chemical Vapor Deposition(HFCVD) System

The BWS HFCVD System is a fully customizable hot filament chemical vapor deposition system designed for the synthesis of nanodiamond coatings, CVD diamond films, Microcrystalline CVD diamond coatings, graphene, carbon nanotubes (CNTs), and a variety of other thin film coatings.

Designed for an affordable and simplified deposition process, the HFCVD System is used in universities and research labs throughout the USA and internationally. It offers several built-in and custom features necessary to begin the deposition of high-quality films within hours of installation. With HFCVD, advanced custom material exploration and discovery are possible, with customizable capabilities for machine learning, automation, and integration with artificial intelligence systems.

Nanodiamond Coatings
Microcrystalline Diamond Coatings
CVD Diamond Films
Graphene
Carbon Nanotubes (CNT)
Multiple Other Thin Film Coatings
Get a Custom Quote

CVD Diamond Research Capabilities

Microcrystalline & Single Crystal Diamond
Other coat
Doped Epilayers & Device Prototyping
Coated
Quantum Centers & NV Research
Plasma on substrate
Diamond Heterostructures & Coatings
Diamond Coatings
Microcrystalline & Single Crystal Diamond
Single Crystal Diamond
Doped Epilayers & Device Prototyping
Diamond structure
Quantum Centers & NV Research
Chamber picture
Diamond Heterostructures & Coatings
Plasma

See Blue Wave Systems in Action

Explore live demonstrations and key capabilities of our custom semiconductor deposition equipment.

Blue Wave Semi Pulsed Laser Deposition (PLD) System 2024

The BWS PLD System is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high-quality thin films of metal-oxides, nitrides, and multilayer thin film device research.

View Specifications

Sputtering Process

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. Sputter deposition is a physical vapor deposition (PVD) method for depositing thin films onto a substrate.

View Specifications

HFCVD Heater Z and Rotation Stage

Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700°C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.

View Specifications

In-Depth System Information

1 High-Vacuum Deposition Chamber

  • The chamber is constructed of stainless steel with double walls and is water-cooled, ensuring optimal growth conditions.
  • The vacuum chamber is subjected to leak testing with helium at a minimum of 10⁻⁹ mbar-L/sec.
  • Supports high vacuum operation with multiple ports for sample loading, viewing, and instrumentation.
  • Customizable windows and access points allow in-situ observation and process flexibility.
  • Constructed for durability and long-term use under high-temperature conditions.

2 System Framework

  • A robust clean room-grade frame designed for holding the chamber and system components.
  • Integrated rackmount mounting for electronics, power distribution, and control systems.
  • Equipped with mobility and leveling features for easy installation and adjustment.

3 Chamber Pumping:

  • Includes an oil mechanical pump capable of achieving high vacuum levels better than 5×10⁻³ Torr.
  • Includes all relevant hardware, vacuum plumbing, and valves necessary for pumping and venting operations.
  • Compact, efficient design optimized for stability and long-term use.
  • If selected, a turbo pump will further pump down the chamber achieving high vacuum levels better than 1×10⁻⁶ Torr.

4 Oil Mechanical Pump

  • High-performance rotary vane oil pump optimized for process stability.
  • Equipped with an isolation valve to protect against back-streaming.

5 Gas Flow and Pressure Control

  • Includes an enclosure that houses the system’s mass flow controllers (MFCs) and interfaces with the user’s exhaust system to mitigate any potential gas leaks.
  • Blue Wave Semiconductor provides a tailored selection of MFCs for users to select from. (Please see the specification table)
  • All MFCs are constructed with gas shut-off valves for overpressure and cross contamination prevention.
  • Includes a closed-loop pressure controller for precise pressure regulation.
  • Contained in the ventilated gas cabinet is a pressure relief valve for maximum safety.

6 Vacuum Gauge

  • Includes a combination gauge integrating capacitance and Pirani measurement methods.
  • If a turbo is added, a full range gauge will be provided to measure from atmospheric pressure to 10⁻⁹ Torr.
  • The gauge contains a digital pressure readout.
  • Includes all mounting hardware and cables.
  • Easy to operate and clean, resisting metal and oxide contamination over extended use.

7 Filament Power and Replacement

  • High current DC power supply capable of heating filaments to temperatures required for deposition.
  • Filament holder designed for easy installation and replacement of filaments.
  • Water flow interlock included.

8 Substrate Holder/Adjustment

  • Rotation and distance adjustment via Z-stage improve uniformity of deposition.
  • Temperature monitored and regulated for reproducible results.
  • Accommodates substrates up to 8-inch.

9 System Cooling

  • Water-cooled components maintain stable operation during high-temperature processes.
  • Designed to enhance process stability and repeatability.
  • Components that necessitate water cooling will be directed to a shared flow indicator located near the rear of the assembly.

10 Computer Control

Includes a computer equipped with custom software, which includes, but is not limited to:

  • Gas flow control and monitoring
  • Pressure control and monitoring
  • Vacuum measurements
  • DC current and voltage control and monitoring
  • Temperature measurement (If selected)
  • Adjustable safety interlocks
  • A library for users to save custom recipes
OP-1. Additional Gas/Mass Flow Controller:

The user may add up to 6 additional MFCs into the system. The gases associated with the MFCs may include but are are not limited to, Nitrogen (N₂), Argon (Ar), and various dopant gases. Contact Blue Wave for additional mass flow controller selection.

OP-2. High Vacuum using a Turbo Molecular Pump:

A Turbo Molecular Pump, including a controller, can be integrated to achieve a high vacuum better than 5×10⁻⁶ Torr. This option encompasses the necessary valves and high vacuum programming logic, which are prepared for high vacuum creation to initiate deposition with appropriate gas flow and to attain suitable process pressure for microwave plasma deposition.

OP-3. Two-Color IR Pyrometer for Sample Temperature Measurement:

A two-color infrared pyrometer designed for temperature monitoring via optical fiber, featuring a bright LED digital display. It is ideally suited for highly precise measurement of MPCVD sample temperatures. The device offers exceptional speed and accuracy, with a response time of 10 milliseconds and an accuracy of 0.2% of the full scale.

OP-4. Large Area Hot Filament Chemical Vapor Deposition (LAHFCVD) Upgrade::

The HFCVD can be upgraded to accommodate up to an 8-inch wafer. The LAHFCVD can either deposit on one 8 Inch or multiple smaller substrates. This upgrade increases the components of the system such as the chamber size, frame size, etc.

OP-5. Load Lock Wafer Transfer Mechanism:

A chamber isolated with a gate valve that allows for in-situ sample transfer. Contains an additional vacuum gauge for load lock pressure readings. Contains a sample loading arm.

OP-6. Substrate Heater and Temperature Controller

The substrate holder may be upgraded to incorporate a Blue Wave brand Inconel substrate heater for precise substrate temperature regulation and monitoring. The substrate heater operates at a maximum temperature of 600˚C, with a temperature uniformity of within 10%. Additionally, it includes a stainless-steel shield equipped with six 4-40 tapped holes for sample clamping. The substrate heater element is sealed to prevent exposure to reactive gases and plasma during deposition. Includes a Blue Wave temperature controller that precisely manages the substrate heater temperature, powers it, and provides temperature readings.

Accessories coming soon. Contact us for compatible components and add-ons.
📄

HFCVD-Graphene-Plus-Brochure-Nov-MRS

Download our detailed brochure for complete specifications, configuration options, and ordering information.

View Product Page

Technical Specifications

HFCVD

Specification Parameter
Vacuum With Turbo Pump1 × 10-6 Torr
Vacuum Without Turbo Pump1 × 10-2 Torr
Pressure Control Range0 - 1000 Torr
Temperature Range500 - 2500°C
Gas Flows (MFCs)- Hydrogen (H2) 0 - 500 SCCM (Customizable)
- Methane (CH4)0 - 10 SCCM (Customizable)
- Optional additional MFCs
System Input PowerOne 208 VAC 3Φ power source. (Customizable)
Filament Power Supply5 - 10 kW
Vacuum PumpOil Pump
Turbo Pump Speed (If applicable)90 L/s
Mechanical Pump Speed15 m3/hr
CoolingWater Cooling
Vacuum SealsElastomer O-rings, Copper Gaskets
Deposition Area.5” - 2” Diameter
Deposition Rate
Substrate HolderMolybdenum (Mo)
System ChamberStainless Steel Water-Cooled
Interlock Control- Water Flow
- Over Pressure
- Chamber Temperature
- Power Deviation
- Emergency stop
System Size- Width: 3.5 ft
- Depth: 3 ft
- Height: 6 ft

Large Area HFCVD

Specification Parameter
Vacuum With Turbo Pump5 × 10-6 Torr
Vacuum Without Turbo Pump5 × 10-2 Torr
Pressure Control Range0 - 1000 Torr
Temperature Range500 - 2500°C
Gas Flows (MFCs)- Hydrogen (H2) 0 - 500 SCCM (Customizable)
- Methane (CH4)0 - 10 SCCM (Customizable)
- Optional additional MFCs
System Input PowerOne 480 VAC 3Φ power source. (Customizable)
Filament Power Supply20 - 30 kW
Vacuum PumpOil Pump
Turbo Pump Speed (If applicable)250 L/s
Mechanical Pump Speed18 m3/hr
CoolingWater Cooling
Vacuum SealsElastomer O-rings, Copper Gaskets
Deposition Area.5” - 12” Diameter
Deposition Rate
Substrate HolderMolybdenum (Mo)
System ChamberStainless Steel Water-Cooled
Interlock Control- Water Flow
- Over Pressure
- Chamber Temperature
- Power Deviation
- Emergency stop
System Size- Width: 5 ft
- Depth: 3 ft
- Height: 6 ft

OUR OTHER PRODUCTS

Related Products

Can't find what you need?

Call us: +1 (410) 907-6807 or email info@bluewavesemi.com
Request a Quote