Inconel Substrate Heater
High-Temperature Substrate Heating for Demanding Deposition Environments
The BWS Inconel Substrate Heater delivers precise, uniform heating across substrate sizes from 1.0” to 10”. Built from Inconel alloy for exceptional oxidation resistance and thermal stability at elevated temperatures encountered in PLD, CVD, and sputtering processes.
Available in eight standard sizes to match your chamber geometry and substrate requirements — from small-batch research runs to large-area deposition campaigns.
Prices shown per unit. Custom configurations available on request.
View cart →Optimized for High-Temperature Deposition
PLD Systems
Precise substrate heating during Pulsed Laser Deposition enables epitaxial thin film growth and precise phase formation control.
CVD Processes
Maintains substrate at optimal reaction temperatures for uniform chemical vapor deposition across the full substrate area.
Sputtering
Compatible with magnetron and RF sputtering systems where elevated substrate temperatures are required for crystalline film quality.
Oxide & Nitride Growth
High-temperature stability is essential for oxide and nitride film deposition, where Inconel construction provides the necessary durability.
Heater Specifications
Every BWS Inconel Substrate Heater is precision-fabricated for reliability at the high temperatures demanded by advanced thin film deposition processes.
| Specification | Parameter |
|---|---|
| Material | Inconel Alloy |
| Available Sizes | 1.0”, 1.6”, 2.2”, 3.1”, 4.1”, 6.1”, 8.1”, 10” |
| Vacuum Compatibility | UHV Compatible |
| Oxidation Resistance | High — Inconel Alloy |
| Temperature Uniformity | Excellent across substrate area |
| Mounting | Compatible with BWS deposition systems |
| Configuration | Custom sizes available on request |
Size & Pricing Reference
| Size | Product | Price (USD) |
|---|---|---|
| 1.0” | 1.0 Inch Inconel Substrate Heater | $3,700.00 |
| 1.6” | 1.6 Inch Inconel Substrate Heater | $4,200.00 |
| 2.2” | 2.2 Inch Inconel Substrate Heater | $5,200.00 |
| 3.1” | 3.1 Inch Inconel Substrate Heater | $7,000.00 |
| 4.1” | 4.1 Inch Inconel Substrate Heater | $9,000.00 |
| 6.1” | 6.1 Inch Inconel Substrate Heater | $10,600.00 |
| 8.1” | 8.1 Inch Inconel Substrate Heater | $13,000.00 |
| 10” | 10 Inch Inconel Substrate Heater | $16,000.00 |
Heater Components & Features
1 Inconel Alloy Construction
- Fabricated from high-performance Inconel alloy for demanding thermal environments
- Exceptional resistance to oxidation and corrosion at elevated temperatures
- Maintains structural integrity across repeated thermal cycling
- Compatible with reactive and oxidizing deposition atmospheres
- Long service life compared to standard stainless steel heater elements
2 Substrate Heating Performance
- Uniform temperature distribution across the full substrate area
- Available in eight sizes to match standard substrate diameters
- Designed for epitaxial growth, oxide formation, and crystalline thin films
- Stable heat output for reproducible deposition run-to-run
- Suitable for PLD, CVD, sputtering, and thermal evaporation platforms
3 Vacuum Compatibility
- Fully compatible with high-vacuum and ultra-high vacuum (UHV) environments
- Low outgassing at operating temperatures
- No binders or adhesives that could contaminate chamber or film
- Designed for in-vacuum operation without degradation
- Integrates directly into BWS deposition chambers with standard fittings
4 Size Selection & Compatibility
- Eight standard sizes from 1.0” to 10” diameter
- Designed to match common substrate and wafer sizes for research and industry
- Compatible with BWS PLD, MPCVD, HFCVD, and thermal evaporation systems
- Custom sizes and configurations available on request
- Contact BWS to confirm compatibility with your specific chamber
Inconel Substrate Heater — Product Overview
Full product brochure covering material specifications, available sizes, and ordering information for all Inconel Substrate Heater variants.
Download PDFHeater Integration — PLD & CVD Systems
Technical guide for integrating the Inconel Substrate Heater into BWS PLD and CVD platforms, including wiring and mounting instructions.
Download PDFCustom Configuration Request
Need a non-standard size, custom mounting, or integration into a third-party chamber? Request a custom configuration document from our engineering team.
Request DocumentNeed a specific datasheet or thermal characterization report? Contact us and we’ll send it directly.
Pulsed Laser Deposition (PLD)
The Inconel Substrate Heater is the standard substrate heating solution for BWS PLD systems, enabling precise temperature control during epitaxial film growth.
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DEAR — MPCVD
Compatible with the Blue Wave DEAR MPCVD system for substrate pre-heating and in-situ temperature control during microwave plasma CVD processes.
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Hot Filament CVD
Integrates with Hot Filament CVD systems where controlled substrate temperature is critical for uniform diamond and hard-coating deposition.
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Thermal Evaporator
Custom heater variants for Bell Jar thermal evaporation systems, providing substrate heating for improved film adhesion and crystallinity.
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