Diamond Exploratory & Applied Research MPCVD
Versatile CVD Diamond Research at an Affordable Price
The Blue Wave DEAR MPCVD system is designed for CVD diamond researchers working in electronics and quantum photonics. Its defining feature is a replaceable quartz tube reaction chamber — allowing researchers to use the same system across a variety of dopants without cross-contamination.
The system supports synthesis of CVD diamond in epitaxial, single crystal, polycrystalline, microcrystalline, and nanocrystalline forms — doped and undoped — with growth rates from 0.1 to 3 μm/hr.
CVD Diamond Research Capabilities
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HFCVD Heater Z and Rotation Stage
Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700°C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.
View SpecificationsSputtering Process
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. Sputter deposition is a physical vapor deposition (PVD) method for depositing thin films onto a substrate.
View SpecificationsHFCVD Heater Z and Rotation Stage
Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700°C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.
View SpecificationsIn-Depth System Information
1 Deposition Chamber
- Quartz tube reaction chamber designed to produce high-quality CVD diamond without silicon impurity incorporation from the quartz wall
- Substrate stage capable of holding up to 1×1 cm² diameter substrate
- Easily replaceable chamber to avoid cross-contamination between different dopants
- Quartz tube and microwave cavity cooled using combined water and airflow
2 Vacuum Pump
- Mechanical dry pump with base pressure better than 2×10⁻² Torr
- Used for evacuating the main CVD chamber
- Includes all applicable hardware, vacuum plumbing, and valves for pumping and venting operations
3 Pressure Gauge
- Full-range pressure gauge for accurate pressure readout across all process conditions
- Built-in interlocks for over-pressure safety protection
4 Process Gas Flow Meters
- Mass flow controllers (MFCs) covering a wide variety of flow ranges for high-quality thin film deposition
- All MFCs individually calibrated for specific gases
- Gas shut-off valves on all MFCs for over-pressure safety
5 Pressure Automation
- Integrated pressure controller for precise automatic control of deposition process pressure
- Operating range: 10 Torr to 200 Torr
6 Substrate Holder
- Water-cooled molybdenum (Mo) sample stage
- Stage height adjustable via molybdenum disks (0.5 mm, 1 mm, 3 mm increments) relative to plasma ball
- Substrate temperature control from 700°C to 1200°C
7 Computer Control & Automation
- Gas flow control and monitoring
- Chamber pressure control during process
- Microwave power control with live forward and reflected power readouts
- Vacuum readout and temperature monitoring
- Easy-load process recipes and programmable process steps
- Process graphs for gases, pressure, and temperature
- Safety shutoffs for overpressure, airflow, water flow, gas deviations, and high reflected microwave power
8 Microwave Components
- 1.5 kW microwave power supply
- Magnetron, short circuit, and manual 3-stub tuner
- Operating frequency: 2.45 GHz
9 Equipment Frame
- Aluminum frame with front panels mounted on 19” DIN rack rails
- Enclosed rackmount design housing all electronics, power distribution, and controls
OP-1. Additional Gas/Mass Flow Controller
Add up to 6 additional MFCs into the system. Gases may include Nitrogen (N₂), Argon (Ar), and various dopant gases. Contact Blue Wave for additional mass flow controller selection.
OP-2. High Vacuum Using a Turbo Molecular Pump
A turbo molecular pump with controller can be integrated to achieve high vacuum better than 5×10⁻⁶ Torr. Includes necessary valves and high-vacuum programming logic for deposition initiation at appropriate process pressure.
OP-3. Two-Color IR Pyrometer for Sample Temperature Measurement
Two-color infrared pyrometer for temperature monitoring via optical fiber with bright LED digital display. Ideally suited for highly precise MPCVD sample temperature measurement. Response time: 10 ms, accuracy: 0.2% of full scale.
DEAR MPCVD System Brochure
Download our detailed brochure for complete specifications, configuration options, and ordering information.
View Product PageTechnical Specifications
| Specification | Parameter |
|---|---|
| Base Pressure | 2 × 10⁻² Torr |
| Operating Pressure | 10 – 200 Torr |
| Mechanical Pump Speed | 10 m³/hr |
| Microwave Power | 300 – 1200 Watt |
| Microwave Frequency | 2.45 GHz |
| Input Power | 208 VAC, 3Φ, 10 Amp |
| Substrate Temperature | 700 – 1200°C |
| Vacuum Pump | Dry Pump |
| Cooling | Forced Air & Water Cooling |
| Vacuum Seals | Elastomer O-rings |
| Deposition Area | 0.5” to 1” Diameter |
| Substrate Holder | Molybdenum (Mo) |
| Tube Reactor | Quartz |
| Temperature Sensor | Two-Color Pyrometer |
| H₂ Flow | 0 – 500 SCCM |
| CH₄ Flow | 0 – 20 SCCM |
| Ar Flow | 0 – 100 SCCM |
| System Size | 5 ft × 2.5 ft × 4.5 ft (W×D×H) |