1 High-Vacuum Deposition Chamber

• Spherical chamber made from electro-polished 304 stainless steel.
• Multiple ports for target carousel, substrate heater, turbo pump and gate valve, viewports, laser port, and additional accessories.
• Leak-tested to 10⁻⁹ mbar·L/sec He; achieves ultra-high vacuum (UHV) levels of 5×10⁻⁷ Torr or better.
• Bakeable up to 150°C to minimize outgassing and leaks
• Adjustable chamber orientation for adjustable laser input.

2 System Framework

• A robust clean room-grade frame designed for holding the chamber and system components.
• Integrated rackmount mounting for electronics, power distribution, and control systems.
• Equipped with mobility and leveling features for easy installation and adjustment.

3 Chamber Pumping

• Includes an integrated Turbo Pump.
• Includes a mechanical dry pump serving as a backing pump to achieve a rough vacuum.
• Includes all relevant hardware, vacuum plumbing, and valves necessary for pumping and venting operations.
• Maximum reliability within a compact design.
• High pumping speed and maximum compression for all gases.
• Integrated drive electronics, appropriate for industrial settings.
• Continuous monitoring of operational data.

4 Dry Mechanical Pump

• Oil-free scroll pump to prevent any hydrocarbon oil fumes that could contaminate the process.
• Oil-free maintenance for the pump.

5 Gas Flow and Pressure Control

• Includes an enclosure that houses the system’s mass flow controllers (MFCs) and interfaces with the user’s exhaust system to mitigate any potential gas leaks.
• Blue Wave Semiconductor provides a tailored selection of MFCs for users to select from. (Please see the specification table)
• All MFCs are constructed with gas shut-off valves for an overpressure safety shut-off feature.
• A combination of gas flow and vacuum pumping is utilized to achieve the desired chamber pressure.
• Contains over-pressure safety protection.

6 Vacuum Gauge

• Includes a full range vacuum gauge and a process vacuum gauge.
• The full range gauge measures from atmospheric pressure to 10⁻⁹ Torr.
• The process gauge enables accurate pressure measurements during operation.
• Both gauges contain a digital pressure readout.
• Includes all mounting hardware and cables.
• Easy to operate and clean, resisting metal and oxide contamination over extended use.

7 Target Carousel

• Motorized six-position carousel allows multiple targets without venting the chamber.
• Targets rotate and raster for uniform laser ablation.
• Target clamps minimize contamination and eliminate the need for silver paste.

8 Deposition Process Pressure Automation

• The substrate heater operates at a maximum temperature of 950˚C, with a temperature uniformity of within 10%. Additionally, it includes a stainless-steel shield equipped with six 4-40 tapped holes for sample clamping.
• The substrate heater element is sealed against exposure to reactive gases and plasma deposition.
• Includes a Blue Wave temperature controller that precisely manages the substrate heater temperature and provides it with power while providing the temperature readings.

9 Substrate Holder

• Fully adjustable optics mount for height, angle, and distance relative to the target.
• Supports a variety of lenses to meet specific deposition requirements.

10 Deposition Process Pressure Automation

Includes a computer equipped with custom software, which includes, but is not limited to:

• Gas flow control and monitoring
• Pressure control and monitoring
• Vacuum measurements
• Target Carousel Control and monitoring
• Temperature control and measurement of the substrate heater
• Adjustable safety interlocks