Inconel Substrate Heater
A substrate heater is required for thin film deposition to crystallize a film during deposition. BWS developed substrate heater stages for PLD, sputter, e-beam, CVD, MPCVD, etc. The BWS Substrate Heater is a fully customizable and highly cost-effective solution, designed to provide exceptional uniformity in high-precision temperature control for both thin film research and industrial applications. Engineered for environments where consistent heat distribution is crucial, this heater excels in processes such as pulsed laser deposition (PLD), reactive sputtering, chemical vapor deposition (CVD), and thermal and e-beam evaporation. Its compatibility with a wide range of gases, including O₂, NH₃, SiH₄, CH₄ and H₂S further enhances its versatility, making it an ideal choice for diverse thin film applications.
CVD Diamond Research Capabilities
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Blue Wave Semi Pulsed Laser Deposition (PLD) System 2024
The BWS PLD System is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high-quality thin films of metal-oxides, nitrides, and multilayer thin film device research.
View SpecificationsSputtering Process
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. Sputter deposition is a physical vapor deposition (PVD) method for depositing thin films onto a substrate.
View SpecificationsHFCVD Heater Z and Rotation Stage
Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700°C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.
View SpecificationsIn-Depth System Information
1 Heater Base
The heater part is securely positioned within the heater base holder, which features adjustable mounts that function as clamps, allowing for easy loading and filament replacement. Both the base and the heater are constructed from Inconel material, ensuring superior resistance to oxidation and corrosion, even under high-temperature and harsh environmental conditions. This robust design guarantees long-lasting durability and consistent performance in demanding applications.
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Technical Specifications
| Specification | Parameter |
|---|---|
| Operating Temperature Range | 0 to 850°C (1562°F) |
| Vacuum Compatibility | Able to operate at ultra-high vacuum (UHV) down to 10⁻⁸ Torr to 1atm |
| Material | Oxidation, corrosion, and chemical resistant Nickel alloy (high-temperature, high-strength material) |
| Size Option | 1”, 1.6”, 2,2”, 3.1”, 4.1”, 6.1”and 8.1”. |
| Power Supply | PID-controlled with 110V-220V input |
| Temperature Sensor | Integrated K-type thermocouple with extended flexible and insulated thermocouple wires for accurate temperature monitoring |
| Electrical Conductivity | Flexible glass fiber insulated wire conductors for safe and efficient power delivery |
| Substrate Clamping | Inconel collar with tapped holes for secure substrate clamping during heating |
| Heating Element Protection | Collar designed to protect the heating element from environmental exposure |
| Gas Compatibility | - O₂ - NH₃ - SiH₄ - CH₄ - other chemical vapors for various deposition techniques |
