Nanofurnace System
The Nanofurnace Deposition System is a state-of-the-art thermal chemical vaporization system with a quartz reactor designed for growing nano deposition materials on a wide variety of substrates. This system is an excellent tool for nano materials metal-oxides, nitrides, metals, and carbon materials such as CNTs and graphene.
CVD Diamond Research Capabilities
See Blue Wave Systems in Action
Explore live demonstrations and key capabilities of our custom semiconductor deposition equipment.
Blue Wave Semi Pulsed Laser Deposition (PLD) System 2024
The BWS PLD System is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high-quality thin films of metal-oxides, nitrides, and multilayer thin film device research.
View SpecificationsSputtering Process
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. Sputter deposition is a physical vapor deposition (PVD) method for depositing thin films onto a substrate.
View SpecificationsHFCVD Heater Z and Rotation Stage
Blue Wave Substrate/Wafer rotation products are capable of reaching up to 700°C while rotating up to 10-20 rpm. Compatible with reactive sputtering, PLD, PVD, e-beam and thermal evaporation, PECVD, ALD, in UHV or inert and reactive gas environments.
View SpecificationsIn-Depth System Information
1 Applications
- Carbon Nanotubes
- Graphene Synthesis
- ZnO nanowires
- Substrate Annealing
- Oxidation
2 Features
- High temperature quartz tube reactor design
- Excellent temperature uniformity over T length
- Thermal Process ranging from RT to 1100°C
- Mechanical vacuum pump for low pressure TCVD (base pressure better than 5E-2Torr)
Liquid bubbler for liquid precursors
Automated process pressure controller
Auxiliary gas mass flow controllers
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Technical Specifications
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