Custom Gas Cabinet
Precision Gas Delivery for Advanced Deposition Systems
The Blue Wave Semiconductor Gas Cabinet is a fully customizable, precision-engineered gas-delivery solution designed for safe, stable, and accurate control of process gases used in CVD, PVD, and a wide range of advanced deposition systems.
Built to meet diverse research and production requirements, the cabinet integrates customer-specified mass flow controllers (MFCs), advanced safety features, and optional PLC-based automation.
Pricing varies based on configuration. Request a quote for your specific requirements.
Custom Configuration Request
Tell us about your project and requirements. Our engineering team will reach out to discuss a custom Gas Cabinet configuration that fits your workflow.
Reliable Gas Control Across Every Platform
CVD & PVD Systems
Delivers precise, stable gas flow for CVD and PVD processes, ensuring consistent thin-film deposition and repeatable process conditions.
Research Laboratories
Flexible multi-gas delivery system for research labs requiring customizable MFC configurations and independent gas line control.
Production Environments
Built for stable, repeatable gas flow control in production settings where consistency and uptime are critical.
Advanced Materials
Supports advanced materials development and thin-film synthesis requiring precise multi-gas management.
Cabinet Specifications
The BWS Gas Cabinet is engineered for safe, precise gas delivery in demanding research and production deposition environments.
| Specification | Parameter |
|---|---|
| Enclosure | Durable steel, multiple sizes available |
| Standard Dimensions | 20″ H × 10″ D × 14″ W |
| Mobility | Mobile with integrated wheels |
| Standard Gases | H₂ (0–200 sccm), CH₄ (0–20 sccm), Ar (0–20 sccm) |
| Additional MFCs | Available upon request |
| Safety | Independent shut-off valves + user interlock input |
| Power | 110–120 VAC, 60 Hz, NEMA 5-15 |
| Optional Control | Blue Wave PLC software package |
| Ventilation | Optional external exhaust port |
Cabinet Features & Systems
1 Precise Gas Flow Control
- Configurable MFCs for customer-specified gases and flow ranges
- Standard set includes H₂, CH₄, and Ar with custom ranges available
- Each MFC equipped with independent shut-off valve
- Internal plumbing minimizes cross-contamination between gas lines
- Stable, repeatable flow rates critical for thin-film quality
2 Safety & Interlock
- Independent shut-off valves on every MFC for over-pressure protection
- User interlock input for fail-safe shutdown during unsafe conditions
- Ventilation port for external exhaust integration
- Durable steel enclosure for safe gas containment
- Designed to meet lab safety standards for hazardous gas handling
3 Optional PLC Automation
- Blue Wave PLC software package available upon request
- Full digital control of gas routing and flow rates
- Customizable interface tailored to customer workflows
- Enables automated gas sequencing and process recipes
- Seamless integration with BWS deposition system controls
4 Mobile & Flexible Design
- Integrated wheels for easy repositioning within the lab
- Available in multiple sizes based on customer requirements
- Compact standard footprint (20″ H × 14″ W × 10″ D)
- Compatible with a wide range of CVD, PVD, and deposition setups
- Custom configurations available for unique system requirements
DEAR — MPCVD
Provides precise H₂, CH₄, and Ar flow control essential for diamond growth in the Blue Wave DEAR MPCVD system.
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Hot Filament CVD
Compatible with HFCVD systems for precise multi-gas delivery during diamond and hard coating deposition processes.
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Pulsed Laser Deposition
Supports PLD systems requiring background gas control and precise atmosphere management during thin-film deposition.
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