Thermal Chemical Vapor Deposition (TCVD) System
Blue Wave Semiconductor offers the TCVD System, a versatile platform engineered for controlled chemical vapor deposition of advanced nanomaterials such as MoS₂, WS₂, and graphene. Designed around a robust quartz tube reactor, the system accommodates multiple small substrates or wafer pieces for flexible research workflows. The reactor assembly is built for stable thermal performance, precise gas handling, and reliable sealing, ensuring consistent growth conditions.
The TCVD System incorporates a digitally controlled high temperature heating module capable of reaching 1100 °C. Its vacuum-compatible quartz tube is sealed with O-rings and stainless-steel flanges, and it features integrated gas inlet/outlet hardware enabling operation under vacuum or controlled-gas environments. This system is well suited for university laboratories, advanced R&D programs, nanomaterials development, prototype device fabrication, and thin film materials.
Get a Custom QuoteVersatile Thin Film Capabilities
Graphene growth
Optical Transparent Coatings
Oxide and Nitride Coatings
Die-electric Coatings (Low and High-k)
Metallic Coatings
Multilayer thin films
Semiconductor Layer (Epitaxial Growth)
Wear Resistant Coating
Photovoltaic thin film (Solar Cell)
Hard Carbon Coating
Barrier Layers for Corrosion and Diffusion (Si3N4, TiN)
MoS2 Growth Coatings
In-Depth System Information
1Quartz Deposition Chamber
- The vacuum chamber is equipped with a replaceable quartz tube designed to prevent cross-contamination.
- The quartz tube is equipped with a stainless steel adapter that employs O-rings to establish a seal around the quartz tube. These stainless steel adapters can be conveniently removed for the purpose of replacing the quartz tube and maintaining the cleanliness of the O-rings.
- The stainless steel adapters are equipped with quick access ports on both sides, increasing how easy it is to load the sample.
- The quartz tube is precisely positioned within the furnace to ensure optimal heating efficiency and uniform thermal exposure.
2System Framework
- A robust clean room-grade frame designed for holding the furnace and system components.
- Integrated rackmount mounting for electronics, power distribution, and control systems.
- Equipped with mobility and leveling features for easy installation and adjustment.
3Chamber Pumping
- Includes an oil mechanical pump capable of achieving high vacuum levels better than 5×10⁻³ Torr.
- Includes all relevant hardware, vacuum plumbing, and valves necessary for pumping and venting operations.
- Compact, efficient design optimized for stability and long-term use.
4Oil Mechanical Pump
- High-performance rotary vane oil pump optimized for process stability.
- Equipped with an isolation valve to protect against back-streaming.
5Gas Flow and Pressure Control
- Includes an enclosure that houses the system's mass flow controllers (MFCs) and interfaces with the user's exhaust system to mitigate any potential gas leaks.
- Blue Wave Semiconductor provides a tailored selection of MFCs for users to select from. (Please see the specification table)
- All MFCs are constructed with gas shut-off valves for overpressure and cross contamination prevention.
- Includes two closed-loop pressure controllers for precise pressure regulation at low and high pressure.
- Contained in the ventilated gas cabinet is a pressure relief valve for maximum safety.
6Vacuum Gauge
- Includes a combination gauge integrating capacitance and Pirani measurement methods.
- The gauge contains a digital pressure readout.
- Includes all mounting hardware and cables.
- Easy to operate and clean, resisting metal and oxide contamination over extended use.
7Furnace
- The furnace provides adjustable heating across the three process zones, allowing users to tailor thermal profiles to specific process requirements.
- The quartz tube is precisely positioned within the furnace to maximize heating efficiency and maintain stable temperature profiles.
- The system provides precise temperature controllability, enabling consistent and repeatable thermal conditions throughout the process.
- Designed for clean operation and long‑term reliability, the furnace accommodates high‑temperature processing without introducing contamination.
8Substrate Boat
- The substrate boat is constructed from high‑temperature ceramic to ensure stability and compatibility with demanding thermal processes.
- It accommodates a range of sample sizes and materials.
- The holder is designed for straightforward operation, allowing easy loading and unloading using the provided loading rod.
9System Cooling
- Water-cooled components maintain stable operation during high-temperature processes.
- Designed to enhance process stability and repeatability.
- Components that necessitate water cooling will be directed to an integrated chiller.
10Computer Control
- Includes a computer equipped with custom software, which includes, but is not limited to:
- - Gas flow control and monitoring
- - Pressure control and monitoring
- - Vacuum measurements
- - Furnace power control and monitoring
- - Temperature measurement
- - Adjustable safety interlocks
- - A library for users to save custom recipes
OP-1. Additional Gas/Mass Flow Controller
May include, but are not limited to, Nitrogen (N₂), Argon (Ar), and various dopant gases. Contact Blue Wave for additional mass flow controller selection.
OP-2. System Fume Hood
An external fume hood can be integrated to provide enhanced ventilation and safe removal of process exhaust. Compatible with standard laboratory ducting and exhaust systems for straightforward installation.
System Specifications
Every BWS system is precision-engineered and fully customizable to meet your research requirements.