Heater Shutter
Precision Flux Control for Thin Film Deposition Systems
The BWS Heater Shutter provides fast, reliable open/close control between the heating element and substrate, enabling precise deposition timing, clean layer interfaces, and source conditioning in PVD, CVD, and PLD environments.
Compatible with BWS deposition systems and designed for high-vacuum operation — the Heater Shutter is an essential accessory for repeatable, high-quality thin film processes.
Volume Pricing
| Quantity | Unit Price |
|---|---|
| 1 – 4 | $33.60 |
| 5 – 9 | $32.60 |
| 10 – 24 | $31.60 |
| 25 – 49 | $30.60 |
| 50+ | $30.00 |
Critical Control for Every Deposition Platform
PLD Systems
Holds back material flux during substrate temperature stabilization, ensuring clean epitaxial growth starts with sharp interfaces.
CVD Processes
Enables source conditioning and outgas purging before exposing the substrate, preventing contamination in CVD film stacks.
Thermal Evaporation
Gates the evaporation flux during source warm-up and conditioning, ensuring deposition only begins once the source has stabilized.
PVD & Sputtering
Acts as a fast-acting gate between target and substrate, enabling repeatable deposition cycles with consistent film properties.
Shutter Specifications
The BWS Heater Shutter is engineered for repeatable performance under demanding vacuum and high-temperature deposition conditions.
| Specification | Parameter |
|---|---|
| Vacuum Compatibility | UHV Compatible |
| Actuation Type | Motor / Pneumatic / Magnetic (system dependent) |
| Position States | Open / Closed |
| Outgassing | Low — suitable for clean deposition environments |
| Temperature Tolerance | High — suitable for elevated-temperature processes |
| Mounting | Compatible with BWS deposition systems |
| Configuration | Custom configurations available on request |
Volume Pricing Reference
| Quantity | Product | Unit Price (USD) |
|---|---|---|
| 1 – 4 | Heater Shutter | $33.60 |
| 5 – 9 | Heater Shutter | $32.60 |
| 10 – 24 | Heater Shutter | $31.60 |
| 25 – 49 | Heater Shutter | $30.60 |
| 50+ | Heater Shutter | $30.00 |
Shutter Components & Features
1 Flux & Heat Control
- Physically blocks material flux and radiant heat between source and substrate
- Enables temperature stabilization before deposition begins
- Prevents uncontrolled film nucleation during heat-up phases
- Open/close timing directly governs deposited layer thickness
- Supports nanometer-precision thickness control across deposition workflows
2 Interface & Repeatability
- Delivers sharp, well-defined layer interfaces in multilayer film stacks
- Eliminates transitional contamination between sequential depositions
- Consistent open/close actuation for run-to-run reproducibility
- Reduces film thickness variation caused by source instability
- Critical for semiconductor, optical coating, and research applications
3 Vacuum Compatibility
- Fully compatible with high-vacuum and ultra-high vacuum (UHV) environments
- Low outgassing materials to prevent chamber or film contamination
- No adhesives or organic binders — safe for clean deposition processes
- Designed for continuous in-vacuum operation without performance degradation
- Integrates directly into BWS deposition chambers with standard fittings
4 Source Conditioning
- Allows source material outgassing and stabilization while substrate is protected
- Prevents initial contamination burst from reaching the growing film
- Essential for reactive sources, targets, and effusion cells
- Maintains source purity across repeated deposition cycles
- Compatible with PLD, PVD, CVD, and sputtering source geometries
Pulsed Laser Deposition (PLD)
The Heater Shutter is an essential accessory for BWS PLD systems, providing flux gating during substrate heating and source conditioning cycles.
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DEAR — MPCVD
Compatible with the Blue Wave DEAR MPCVD system to control substrate exposure during plasma stabilization and source outgassing phases.
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Hot Filament CVD
Integrates with HFCVD systems where shutter gating during filament warm-up prevents unintended early film nucleation on the substrate.
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Thermal Evaporator
Used with Bell Jar thermal evaporation systems to gate deposition cycles and condition evaporation sources before film growth begins.
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