Pulsed Laser Deposition (PLD) Systems
Engineered for Precision Thin Film Research
The BWS PLD System features an optimized six-target carousel, a high-temperature substrate heater, and a variable-pressure chamber for controlled deposition environments.
Its modular design allows seamless integration with complementary deposition techniques including sputtering, thermal evaporation, CVD, and e-beam systems — enabling hybrid processing and advanced material fabrication.
Versatile Thin Film Capabilities
Oxide, Nitride & Multilayer Films
Metal-oxide, nitride, and complex multilayer heterostructure deposition for electronic and optical devices.
Epitaxial & Crystalline Growth
High-quality crystalline film growth including ferroelectric, piezoelectric, and superconducting oxides.
Optoelectronics & Coatings
Thin films for LEDs, solar cells, and photodetectors, plus protective and functional coatings.
AI-Driven Material Discovery
Rapid material screening and exploration with machine learning and AI system integration.
In-Depth System Information
1 High-Vacuum Deposition Chamber
- Spherical chamber made from electro-polished 304 stainless steel
- Multiple ports for target carousel, substrate heater, turbo pump, viewports, laser port, and accessories
- Leak-tested to 10⁻⁹ mbar·L/sec He; achieves UHV levels of 5×10⁻⁷ Torr or better
- Bakeable up to 150°C to minimize outgassing and leaks
- Adjustable chamber orientation for variable laser input
2 System Framework
- Robust clean room-grade frame for holding the chamber and system components
- Integrated rackmount mounting for electronics, power distribution, and control systems
- Equipped with mobility and leveling features for easy installation and adjustment
3 Chamber Pumping
- Integrated turbo pump with high pumping speed and maximum compression for all gases
- Mechanical dry pump serving as a backing pump for rough vacuum
- Includes all relevant hardware, vacuum plumbing, and valves for pumping and venting operations
- Integrated drive electronics appropriate for industrial settings
- Continuous monitoring of operational data
4 Dry Mechanical Pump
- Oil-free scroll pump to prevent hydrocarbon contamination
- Oil-free maintenance for the pump
5 Gas Flow & Pressure Control
- Enclosure housing the system's mass flow controllers (MFCs) with exhaust interface
- Tailored selection of MFCs available (see specification table)
- All MFCs constructed with gas shut-off valves for overpressure safety
- Gas flow and vacuum pumping combination for desired chamber pressure
- Over-pressure safety protection included
6 Vacuum Gauge
- Full range vacuum gauge measuring atmospheric pressure to 10⁻⁹ Torr
- Process gauge for accurate operational pressure measurements
- Digital pressure readout on both gauges
- Easy to operate and clean, resisting metal and oxide contamination
7 Target Carousel
- Motorized six-position carousel for multiple targets without venting
- Targets rotate and raster for uniform laser ablation
- Target clamps minimize contamination — no silver paste needed
8 Substrate Heater
- Maximum temperature of 950°C with ±10% uniformity
- Stainless-steel shield with six 4-40 tapped holes for sample clamping
- Heating element sealed against reactive gases and plasma
- Includes Blue Wave temperature controller for precise management
9 Optics & Substrate Holder
- Fully adjustable optics mount for height, angle, and distance relative to target
- Supports a variety of lenses for specific deposition requirements
10 Computer Control & Automation
- Gas flow control and monitoring
- Pressure control and monitoring
- Vacuum measurements
- Target carousel control and monitoring
- Temperature control and measurement of the substrate heater
- Adjustable safety interlocks
OP-1. Additional Gas/Mass Flow Controller
Add up to 4 additional MFCs for gases including Nitrogen (N₂), Argon (Ar), and more. Contact Blue Wave for additional MFC selection.
OP-2. Rotation Speed Adjustment
Enables the substrate holder to operate at variable rotational speeds for improved uniformity.
OP-3. Two-Color IR Pyrometer
Infrared pyrometer for temperature monitoring via optical fiber with bright LED display. 10ms response time and 0.2% full-scale accuracy.
OP-4. Load Lock Wafer Transfer Mechanism
Gate-valve-isolated chamber for in-situ sample transfer with additional vacuum gauge and sample loading arm.
OP-5. Add Sputtering, E-Beam, or Thermal Evaporator
The PLD chamber can integrate with other deposition sources. Contact Blue Wave Semiconductors for more information.
OP-6. Add Laser
Compatible with excimer and solid-state lasers. Blue Wave can source the best laser for your needs, or you may purchase separately.
PLD System Brochure
Download our detailed brochure for complete specifications, configuration options, and ordering information.
Download PDF
Target Carousel
Six-target motorized carousel with rotation, rastering, and target selection control. Mounted on an 8” CF flange with ferrofluidic dual-axis feedthrough for high-vacuum reliability.
System Specifications
Every BWS PLD system is precision-engineered and fully customizable to meet your research requirements.
| Specification | Parameter |
|---|---|
| Vacuum With Turbo Pump | 5 × 10⁻⁷ Torr |
| Temperature Range | 50 – 950°C |
| Gas Flows (MFCs) | O₂ 0–200 SCCM (Customizable) |
| System Input Power | 120 VAC 1Φ 20A (Customizable) |
| Vacuum Pump | Dry Pump |
| Turbo Pump Speed | 90 L/s |
| Mechanical Pump Speed | 15 m³/hr |
| Vacuum Seals | Viton & Copper Gaskets |
| Deposition Area | 0.5” to 2” Diameter |
| Deposition Rate | 0.1 – 1 Å/sec |
| Substrate Holder | Stainless Steel |
| System Chamber | Stainless Steel |
| System Size | 3 ft × 2 ft × 6 ft (W×D×H) |
| Interlock Controls | Over Pressure, Temp, E-Stop |